Protective nature of nano-TiN coatings shaped by EPD on Ti substrates Articles uri icon

publication date

  • February 2018

start page

  • 495

end page

  • 500

issue

  • 2

volume

  • 38

International Standard Serial Number (ISSN)

  • 0955-2219

Electronic International Standard Serial Number (EISSN)

  • 1873-619X

abstract

  • The hardness and corrosion resistance of TiN coatings, processed by Electrophoretic Deposition (EPD) to cover polished and unpolished Ti substrates, have been evaluated. A deposition time of 5 min has been enough to obtain a cohesive layer of 7&-8 mum in thickness. The coatings were thermally treated in vacuum atmosphere at 1200 °C for 1 h with heating and cooling rates of 5 °C min−1. The surfaces have been covered homogeneously optimizing the properties of the Ti substrates. Uniform and dense TiN coatings have been obtained onto polished substrates, while on unpolished Ti the nitrogen diffuses toward the substrate, moderately dissolving TiN coating. The nanohardness values of the polished samples have been increased from 2.8&-4.8 GPa up to 6.5&-8.5 GPa. Besides, the corrosion current density has been reduced more than one order of magnitude obtaining a protective efficiency of 82%. These values have been compared with other works in literature where authors used complex and costly processing techniques, demonstrating the strong impact of the colloidal processing over the specific properties of the material.