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The effect of stacking on the near-infrared photoluminescence (NIR-PL) of InGaSb/GaSb quantum wells (QWs) which were inadvertently formed during an attempt to fabricate stacked InSb/GaSb quantum dots (QDs) using atmospheric pressure Metalorganic Vapor Phase Epitaxy (MOVPE) are investigated in this work. The morphology of uncapped dots was studied by means of scanning probe microscopy (SPM) which shows a significant deviation in the shape and density of dots grown directly on the buffer compared to those that terminated an "embedded-dot" sample. Cross-sectional scanning transmission electron microscopy (STEM) and transmission electron microscopy (TEM) of the capped structures clearly revealed the formation of QWs in the capped structures. An increase in the number of InSb QD-layers, which metamorphosed into QWs, was observed to cause an increase in the luminescence spectral line width and a long-wavelength shift of the QW PL lines, together with an enhancement in the strength of PL emission. Variations in layer thicknesses and alloy composition introduced as a result of inter-diffusion of Ga and In which is enhanced by the prolonged annealing time of the QDs (during spacer/cap layer deposition) and In adatom migration is suggested to alter the morphology of the capped dots and induce a change in PL peak positions and the spectral linewidth of the NIR low energy lines. (C) 2018 Author(s).