Dual Photosensitive Polymers with Wavelength-Selective Photoresponse Articles uri icon

authors

  • García-Fernández, Luis
  • Herbivo, Cyril
  • SAN MIGUEL ARNANZ, VERONICA
  • Warther, David
  • Donato, Loïc
  • Specht, Alexandre
  • del Campo, Aránzazu

publication date

  • May 2014

start page

  • 5012

end page

  • 5017

issue

  • 29

volume

  • 26

International Standard Serial Number (ISSN)

  • 0935-9648

Electronic International Standard Serial Number (EISSN)

  • 1521-4095

abstract

  • Polyurethane thin films that photopolymerize and photodegrade upon exposure to light of different wavelengths are presented. The chromic response is based on two caged monomers with the ability to be activated or photocleaved with different wavelengths under single and two-photon excitation. This material represents a dual photoresist with "positive" and "negative" tone contained in a single resist formulation and with the ability to generate complex 2D and 3D patterns.

subjects

  • Chemistry
  • Materials science and engineering

keywords

  • photosensitive polymers; caged compounds; photoremovable groups; wavelength selectivity; photoresist